Optimization of the reflectivity of Al – SiO2 multilayer mirror near UV

In this work were built mirrors with multilayer film of aluminum-silicon dioxide, deposited in glass substratum in a RF-Sputtering chamber, with a view to optimize the reflection inside the cavity of a nitrogen laser that operates in the UV region (337,1 nm). It’s introduced a theoretical simulation of the variation of reflectivity in function of the number of layers, carrying in consideration the kind of the deposited materials. The results were compared with the obtained using common mirrors of aluminum. When compared with mirrors made only of aluminium, it arrives to the conclusion that multilayer get the upper hand, because they introduce reflectivity four superior times.